Mask metrology system
Staff -- Test & Measurement World, 11/1/2004
Combining spectroscopic reflectometry and spectroscopic ellipsometry, the Atlas-M metrology system fully characterizes both masks and reticles, including line width, etch depth, overhang, height, and profile measurements. The SMIF-compatible system features closed-loop temperature control, along with mask handling robotics and staging for 150x150-mm substrates. Its software interface is compliant with standards adopted by SEMI. Nanometrics, Milpitas, CA; www.nanometrics.com.
