JEOL introduces high-throughput SEM/FIB system
-- Test & Measurement World, 12/18/2007 8:11:00 AM
The JIB-4500 MultiBeam scanning electron microscope (SEM) and micro-milling focused ion beam (FIB) system combines the high-resolution imaging of the JEOL LaB6 electron column with real-time milling and monitoring capability. This high-productivity tool can be used for IC defect analysis, circuit modification, TEM thin-film sample preparation, and mask repair.
MultiBeam features serial slicing and sampling for in-process monitoring of milling, fabrication, and reconstruction of 3D images of the sectioned area. A maximum milling current of 30 nA ensures high-throughput mililng of large areas.
The system also features low-vacuum operation for nonconductive specimens without coating or alteration, a gas injection system for etching and deposition, a large stage for up to 150-mm samples, and a complete set of ports for a variety of analytical needs. Samples are loaded through a standard airlock system.
JEOL USA, www.jeolusa.com.
