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Imec demos nanophotonic devices with optical lithography
Test & Measurement World Staff - July 15, 2012
In conjunction with Semicon West, Imec reports the realization of functional sub-100-nm photonic components with optical lithography on 300-mm silicon photonic wafers. Using 193-nm immersion lithography and 28-nm CMOS processes, Imec says that it achieved the lowest propagation loss ever reported in silicon wire waveguides and succeeded in patterning simpler and more efficient fiber couplers. This achievement is an important step in bringing silicon photonic technology in line with CMOS industry standards.
The optical waveguides on 300-mm wafers have very low propagation loss, well below 1 dB/cm. By applying 193-nm immersion lithography for patterning waveguides and fiber couplers, Imec was able to eliminate one patterning step in the processing of photonic devices and reduce processing costs. Moreover, by demonstrating low phase errors on 450-nm arrayed waveguide gratings, Imec’s patterning platform using 45-nm mask technology and 193-nm immersion lithography has proved it can yield a very uniform waveguide width within a device.
Results were obtained in cooperation with Intec, Imec’s associated lab at the Ghent University, and with Imec’s key partners in its core CMOS programs.
